中文摘要：

在氧化铟锡（ITO）导电玻璃的衬底上,利用直接电沉积方法制备了ZnO纳米线或ZnO薄膜.然后利用存储有HCI刻蚀剂的琼脂糖微图案印章对其进行了化学刻蚀以形成不同的图形.利用扫描电子显微镜（SEM）、X射线衍射（XRD）和扫描电化学显微镜（SECM）分别对ITO衬底上的ZnO薄膜的结构、形貌和电化学性质进行表征.

英文摘要：

We report a direct electrochemical deposition process to produce ZnO nanorods or a ZnO thin film on an indium tin oxide（ITO） substrate.The ZnO film was etched by an agarose stamp containing HCI as the etchant to form different patterns.The structure,morphology,and electrochemical properties of the ZnO thin films on the ITO substrate were characterized by scanning electron microscopy（SEM）,X-ray diffraction（XRD）,and scanning electrochemical microscopy（SECM）.