中文摘要：

采用脉冲直流反应磁控溅射技术在不同的占空比条件下制备了氧化钒薄膜。利用X射线光电子能谱仪测定了薄膜的组分,用光谱椭偏仪在300~850nm的波长范围内对薄膜的光学性质进行了研究。实验结果表明降低占空比具有促进金属钒氧化的作用,而通过采用TaucLorentz谐振子色散模型结合有效介质近似模型对椭偏参数Ψ和Δ进行拟合,得到了较为理想的拟合结果。薄膜的复折射率和透过率均由椭偏拟合结果确定,结果发现占空比的下降,导致了可见光范围内薄膜折射率和消光系数的降低以及透过率的提高。

英文摘要：

Vanadium oxide thin films were prepared by pulsed DC reactive magnetron sputtering under different duty cycles.The composition of the deposited films was determined by the X-ray photoelectron spectroscopy,and the optical properties of the films were investigated by a spectroscopic ellipsometer in the wavelength range of 300~850nm.The experimental results show that decreasing the duty cycle favors can enhance the oxidation of vanadium.And the best fitting results of the ellipsometric parametersΨandΔcan be obtained by using the Tauc-Lorentz oscillator associated with the bruggeman effective medium approximation model.The complex refractive index and transmittance of the films were determined from the fitted ellipsometric parameters.And it is found that decreasing the duty cycle will lead to a decrease in the refractive index and extinction coefficient,but an increase in the transmittance.