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Properties of HfO2 thin films prepared by dual-ion-beam reactive sputtering
  • ISSN号：0030-3992
  • 期刊名称：Optics and Laser Technology
  • 时间：0
  • 页码：820-822
  • 语言：英文
  • 相关项目：应用离子后处理技术提高薄膜激光损伤阈值基础研究
作者： Congjuan Wang|Jianda Shao|Zhengxiu Fan|Guangxing Liang|Xingmin Cai|Dongping Zhang|Ping Fan|
同期刊论文项目
应用离子后处理技术提高薄膜激光损伤阈值基础研究
期刊论文 16 会议论文 1
同项目期刊论文
Comparison of TiO2 and ZrO2 films deposited by electron beam evaporation and by sol-gel process
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Influence of substoichiometer on the laser-induced damage characters of HfO2 thin films
Influence of plasma treatment on laser-induced damage characters of HfO2 thin films at 355nm
光学元件激光损伤阈值的指数拟合法以及测试误差分析
1064nm激光脉冲致光学薄膜分层剥落损伤特性
Influence of oxygen plasma treatment on properties of ZrO2 films prepared by e-beam evaporation tech
A comparative study of the influence of different post-treatment methods on the properties of HfO2 s
Effect of process parameters on laser induced damage threshold of TiO2 coatings
Effects of annealing on laser-induced damage threshold of TiO2/SiO2 high reflectors
Effect of oxygen partial pressure on packing density and laser damage threshold of TiO2 thin films
Influence of coating material on laser damage threshold of TiO2 films
1064 nm激光脉冲致光学薄膜分层剥落损伤特性
三种不同后处理方式对ZrO2薄膜性能的影响