中文摘要：

分别利用金属脉冲磁过滤真空阴极弧沉积法（FCVA）、直流磁控溅射法（SP）和脉冲辉光放电等离子体化学气相沉积法（PECVD）在硅片上沉积类金刚石膜层。并利用激光拉曼光谱法（Raman spectroscopy）和X射线光电子能谱法（XPS）对类金刚石膜层进行研究。通过研究分析发现,不同方法制备的类金刚石膜层的G峰位、D峰位、T峰位、半高宽、I（D）/I（G）值、I（T）/I（G）值和sp3键含量各不相同。其中,金属脉冲磁过滤真空阴极弧沉积法制备的类金刚石膜层的G峰位波数最大、I（D）/I（G）和半高宽最小、I（T）/I（G）最大、sp3键含量最高;直流磁控溅射法制备的类金刚石膜层的G峰位波数、I（D）/I（G）、I（T）/I（G）和sp3键含量处于三者之间,G峰的半高宽是最大的;脉冲辉光放电等离子体化学气相沉积法制备的类金刚石膜层的G峰位波数sp3键含量最小、I（D）/I（G）最大、I（T）/I（G）最小。

英文摘要：

Diamond-like carbon（DLC） films were deposited on a silicon chip substrate by a metal pulsed magnetic filtered cathodic vacuum arc deposition technique,a direct current magnetron sputtering technique and a pulsed glow discharge plasma enhanced chemical vapor deposition technique.And the characteristics of DLC films were investigated using laser Raman spectroscopy and X-ray photoelectron spectroscopy.The spectra of diamond like carbon were collected using Raman spectrometers with 325 nm flters.It was found that DLC films prepared by various deposition technique have different G-peak,D-peak,T-peak,the full width at half maximum（FWHM）of G-peak,D-peak and T-peak,the intensity ratio I（D）/I（G） and I（T）/I（G） and the sp3 content.Among them,the films grown by metal pulsed magnetic filtered cathodic vacuum arc deposition technique have the largest G-peak wave number and the intensity ratio I（T）/I（G）,the minimum of the intensity ratio I（D）/I（G）,G-FWHM and the maximum sp3 content;those grown by the direct current magnetron sputtering technique have the 2nd largest G-peak wave number,the intensity ratio I（D）/I（G） and I（T）/I（G） and sp3 content,however,they have the largest G-FWHM,while those grown by the pulsed glow discharge plasma enhanced chemical vapor deposition technique have the minimum G-peak wave number and the intensity ratio I（T）/I（G） and sp3 content,and the maximum intensity ratio I（D）/I（G）.