用金属有机物化学气相沉积(MOCVD)法在蓝宝石(0001)衬底上制备出高质量的氧化锡(SnO2)单晶薄膜。对制备薄膜的结构和光学性质进行了研究。制备样品具有纯snO2的四方金红石结构,其外延生长方向为SnO2(100)∥Al2O3(0001)。薄膜均匀、致密,具有很好的取向性和结晶性。透射谱测量结果表明,在可见光区薄膜的绝对透过率达到了90%以上。
High-quality single crystalline SnO2 films have been prepared on the sapphire (0001) substrates by the metalorganic chemical vapor deposition (MOCVD) method. The structural and optical properties of the SnO2 films were investigated. The prepared samples were SnO2 single crystalline films of ruffle structure with an epitaxial relationship of SnO2 (100)//A12O3 (0001). The films were even and compact with high quality of orientation and crystallization. The absolute average transmittance for the film in the visible range exceeds 90%.