采用磁控共溅射方法制备了不同种子层的(Fe10Co90)80Nd20磁性薄膜,研究了种子层对结构和磁性的影响.结果表明,对于相同厚度的薄膜样品,Ta为种子层的样品没有面内各向异性,矫顽力(Hc)达91Oe(1Oe=79.58A/m),表面磁畴为条纹畴结构,具有弱的垂直各向异性;Cu为种子的样品,Hc为30Oe,样品具有面内磁各向异性,各向异性场为60Oe,磁谱测量显示自然共振频率为2.7GHz.对样品进行真空磁场热处理后静态磁测量结果表明,Ta为种子层的样品的磁性及磁畴结构都没有明显变化;Cu为种子层的样品的Hc随退火温度的升高先减小后增大,表面磁畴由制备态的局域条纹畴变为连续的条纹畴结构.
The structure and magnetic properties of (Fe10Co90)80Nd20 films with different seedlayers, deposited on Si〈111〉 substrate by RF magnetron sputtering, have been investigated. The film with underlayer of Ta has a coercivity (He) of 91 Oe and no in-plane anisotropy with stripe domains. A remarkable reduction in Hc and the appearance of in-plane uniaxial anisotropy of FeCoNd film with underlayer of Cu is observed. Then, the films with different underlayers are annealed at different temperatures under vacuum with an external magnetic field of 1300 Oe applied in the film plane. The structure and magnetic properties and magnetic domain of FeCoNd film with underlayer of Ta have insignificant change. However, for Cu/FeCoNd film, the in-plane uniaxial anisotropy disappears and the magnetic domain changes from local stripe domain of as-deposited sample to the continuous stripe domain structure of annealed sample.