中文摘要：

利用射频磁控共溅射方法,通过改变Nd靶溅射功率,制备了一系列Ta/Ndx（FeCo）100-x/Ta纳米薄膜。研究了其结构和磁性随Nd含量和真空磁场退火温度（T）的变化关系。X射线衍射研究表明制备态的薄膜为非晶态,随着退火温度的升高,逐渐析出Fe-Co纳米晶,随T的进一步升高,FeCo纳米晶粒逐渐变大,而且在薄膜中生成了FeCoNd合金纳米晶。利用振动样品磁强计研究了纳米薄膜的静态磁性,结果表明,饱和磁化强度随着Nd含量的升高而降低。经真空磁场热处理的样品都表现出很好的面内磁各向异性,在Ta/Nd20（FeCo80）/Ta样品中获得了易轴矫顽力135.32A/m,难轴矫顽力为199A/m,各向异性场为8166.96A/m的优异静态磁性,表明在高频领域具有很好的潜在应用前景。

英文摘要：

A series of nano-magnetic thin films of Ta/FeCoNd/Ta were fabricated on Si 〈111〉 substrate by RF magnetron sputtering with various power of Nd target. The structure and magnetic properties of FeCoNd films with Nd concentration and annealing temperature with magnetic field under vacuum were investigated. The as deposited films are amorphous. The size of the FeCo and FeCoNd nano-crystallites increases with the increasing of annealing temperature. The results from vibrating sample magnetometer measurement revealed that the saturation magnetization decreases with increasing of Nd concentration. An in plane magnetic anisotropic property of FeCoNd films was obtained by vacuum annealing with magnetic field. The Ta/Nd20（FeCo）80/Ta sample shows the coercivity of 199 and 135.32A/m at easy and hard axes respectively and anisotropic field of 8166.96A/m,indicating the potential application in high-frequency fields.