中文摘要：

用脉冲激光沉积设备，分别在SrTiO3（001）（STO）和MgO（001）基片上外延生长了单层Ni0．8Zn0．2FbO4（NZV）薄膜。经x射线衍射分析，在SID和M舶基片上制备的NZF薄膜均为单-c取向的外延薄膜，由PHI扫描可知薄膜均为四重对称结构。由NZF薄膜的倒易空间图可以计算得到在STO和Mg0基片上应变分别为O．0704和-0．0124。分别对不同基片上的NZF薄膜进行磁强计测量可得，在STO基片上沉积的NZF薄膜的面内和面外饱和磁化强度分别为269．6和224．78emu／cm3，面内和面外的矫顽场分别为2．68×10 4和4．78×10 4A／m，在MgO基片上沉积的NZF薄膜的面内和面外饱和磁化强度分别为219．11和180．75emu／cm3，面内和面外的矫顽场分别为3．46×10 4和5．32×10 4A／m。

英文摘要：

The Ni0.8Zn0.2Fe2O4（NZF） films were epitaxially grown by pulsed laser deposition （PLD） on substrates of SrTiO3（001） （STO） and MgO（001）. The microstructures and magnetic properties of the films were characterized with X-ray diffraction and scanning electron microscopy. The strains of the NZF films on STO and MgO substrates were calculated by means of the reciprocal space maps to be 0.0704 and -0.0124, respectively. The impacts of the deposition conditions on the epitaxial growth were also studied. The results show that the c-oriented epitaxial NZF films have a four-fold symmetry. The in-plane and out-of-plane saturation magnetizations of the NZF on STO were 269.6 emu/cm3 and 224.78 emu/cm3 ; and their coercive fields were 2.68 × 10 4 and 4.78 × 10 4 A/m, respectively. The in-plane and out-of-plane saturation magnetizations of the NZF on MgO were 219.11 emu/cm3 and 180.75 emufcm3; and their coercive fields were 3.46 × 10 4 and 5.32 × 10 4 A/m, respectively.