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中文摘要：
本文提出一种有效非因果学习控制方法,用于晶圆扫描光刻系统.该方法不依赖于精确的系统建模,通过引入时间延迟因子对迭代控制系统的收敛条件进行初步整形.然后选取零相位滤波器来进行二次整形,得到收敛的非因果迭代学习控制律.根据系统的闭环特性,进一步给出延迟因子的参考设计方法和滤波器的选取原则,并对收敛性进行了分析.此外,为提高系统的扫描性能,引入有效学习函数来克服传统学习控制方法的学习盲目性,增强对关键性能指标的学习能力.最后采用模拟的晶圆扫描光刻系统来进行仿真和实验,以验证方法的有效性.
英文摘要：
This paper presents an effective non-causal learning control method which is applied to the wafer scan and lithography system. It is independent of the precise model of the system and introduces a time delay factor to shape the convergence condition of the iterative control system. A zero-phase filter is developed to make a second shaping for the convergence condition; thus, a convergent non-causal iterative learning control law is determined. According to the characteristics of the closed-loop system, we put forward the referential methods for selecting the delay factor as well as the filter, and verify the convergence of the built-up closed-loop system. In addition, an effective learning function is introduced to avoid the blind learning in the traditional method for improving the scanning performance and enhancing the learning abilities of the key performance. Finally, a simulated wafer scan and lithography system is employed to implement simulations and experiments for validating the effectiveness of the proposed method.
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