欢迎您!
东篱公司
退出
申报数据库
申报指南
立项数据库
成果数据库
期刊论文
会议论文
著 作
专 利
项目获奖数据库
位置:
成果数据库
>
期刊
> 期刊详情页
Design and Fabrication on the Electroplating Polishing Pad with Phyllotactic Pattern
期刊名称:Advanced Materials Research
时间:0
页码:289-293
语言:英文
相关项目:基于一种仿生表面Smart垫的化学机械抛光机理研究
作者:
YuShan Lu, ZhiHui Kou,Jun Wang , ChengYi Zhao|
同期刊论文项目
基于一种仿生表面Smart垫的化学机械抛光机理研究
期刊论文 13
专利 4
同项目期刊论文
The contact pressure distribution and its effects on the magnetic disc substrate surface profiles in
基于叶序仿生抛光垫的化学机械抛光的运动分析
Design and Fabrication of the Superabrasive Grinding Wheel with Phyllotactic Pattern
Analysis of the polishing slurry flow of chemical mechanical polishing by polishing pad with phyllot
基于仿生结构锡抛光垫的抛光接触压力分析
叶序结构抛光垫表面的抛光液流场分析
Contact pressure distribution of chemical mechanical polishing based on bionic polishing pad
Analysis on the contact pressure distribution of chemical mechanical polishing by the bionic polishi
硅片抛光的接触压强分布与宏观形貌创成机理
Material removal distribution of chemical mechanical polishing by the bionic polishing pad with phyl
Contact Pressure Intensity Distribution and Its Effects on Workpiece Flatness Error in Plane Polishi
Contact Pressure Intensity Distribution and Its Effects on Workpiece Flatness Error in Plane Polishing with Retaining Ring