中文摘要：

描述了激光线宽对光刻过程的影响模型建立过程中所使用的方法。成像透镜产生的色差结合实际激光光谱可以把激光线宽的影响包括在光刻模拟的模型中,使用PROLITH软件模拟了线宽对空间像的临界尺寸、焦深、曝光宽容度的影响,孤立线和半孤立线条尺寸在240nm到140nm的范围内完成研究。实验结果表明,光刻过程中增加激光线宽使空间成像质量变差,较大的线宽也导致了曝光宽容度的损失。

英文摘要：

This paper decribes the assumptions and methodology used for modeling of the impact of laser linewidth on the lithographic process. The chromatic aberrations of an imaging lens combined with real laser spectra are used to include the impact of laser linewidth into the lithograghic simulation model. Using PROLITH simulation software investigated the effect of linewidth on depth of focus, aerial image critical dimensions, and exposure latitude. Simulation results show that the impact of the linewidth is lithography process dependent. In general, increased laser linewidth decreases the aerial image. Larger linewidth cao also result in the loss of exposure latitude.