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Structural, optical, and electrical properties of Hf-doped ZnO films deposited by atomic layer depos
  • ISSN号：0257-8972
  • 期刊名称：Surface and Coatings Technology
  • 时间：2013.10
  • 页码：41-45
  • 相关项目：高K栅介质/III-V族半导体界面的原位调控及性能研究
作者： Geng, Yang|Xie, Zhang-Yi|Yang, Wen|Xu, Sai-Sheng|Sun, Qing-Qing|Ding, Shi-Jin|Lu, Hong-Liang|Zhang, David Wei|
同期刊论文项目
高K栅介质/III-V族半导体界面的原位调控及性能研究
期刊论文 18 专利 3
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