位置：成果数据库 > 期刊 > 期刊详情页
Impact of rapid thermal annealing on structural and electrical properties of ZnO thin films grown at
  • ISSN号：0042-207X
  • 期刊名称：Vacuum
  • 时间：2014.5
  • 页码：1-4
  • 相关项目：高K栅介质/III-V族半导体界面的原位调控及性能研究
作者： Zhang, Yuan|Lu, Hong-Liang|Geng, Yang|Sun, Qing-Qing|Ding, Shi-Jin|Zhang, David Wei|
同期刊论文项目
高K栅介质/III-V族半导体界面的原位调控及性能研究
期刊论文 18 专利 3
同项目期刊论文
Templated Fabrication of Core-Shell Magnetic Mesoporous Carbon Microspheres in 3-Dimensional Ordered
原子层淀积技术应用于太阳电池的研究进展
Equivalent oxide thickness scaling of Al2O3/Ge metal-oxide-semiconductor capacitors with ozone post
Effect of ozone treatment on the optical and electrical properties of HfSiO thin films
Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer depo
Structural, optical, and electrical properties of Hf-doped ZnO films deposited by atomic layer depos
Effects of rapid thermal annealing on Hf-doped ZnO films grown by atomic layer deposition
Growth and interfacial properties of atomic layer deposited Al0.7Ti0.3Oy high-k dielectric on Ge sub
Effects of Rapid Thermal Annealing on Structural, Luminescent, and Electrical Properties of Al-Doped
Fabrication of ZnO@TiO2 Core-Shell Nanotube Arrays as Three-Dimensional Anode Material for Lithium I