中文摘要：

研究了磁场作用下电沉积Ni金属膜的生长过程,磁场与电极表面夹角取35°。测试结果表明电流密度、基底织构和磁场对薄膜的织构和表面形貌均具有重要影响。随着电流密度的增加,薄膜的面外织构由（111）为主变为（200）为主,面内织构显著改善;晶粒尺寸随着电流密度的增加显著增大。在电流密度较小时,磁场的作用比较显著,使得面外（111）晶面取向受到抑制,（200）取向得到增强,面内织构也有一定的改善。同时,磁场使晶粒变小,形状更加规则,整体也更均匀。还对磁场、电流和基底的作用机制进行了分析。

英文摘要：

The Nickel films were electroplated under external magnetic field with the angle of 35° between the cathode and magnetic field. It is revealed that the texture and surface morphology of the films was determined by the current density,texture of substrate and the magnetic field. With the current increasing,the out-of-plane texture changed from the （111） to （200）,and the in-plane texture improved. Meanwhile,the size of crystal grain increased. When the current density was relatively low,magnetic field could obviously suppress the （111） orientation and enhance the （200） orientation of the out-of-plane. The in-plane texture became better too. At the same time,the magnetic field could make the sizes of crystal grain smaller and more uniform,the shape of crystal grain more regular. It is also observed that the pinholes on the surface of as-grown films are supressed as well due to the application of magnetic field. The mechanism of the magnetic field,current density and the substrate to the texture and surface morphology have been investigated in the work.