为了更好地理解"黑硅"材料高吸收效率的物理原因,在成功制备了表面具有不同高度的锥状尖峰结构的"黑硅"材料基础上,利用扫描电子显微镜(SEM)获得锥状尖峰的几何参数,并根据该参数进行"黑硅"表面特殊结构建模,计算出"黑硅"材料有效吸收表面积相对于普通平面硅材料的有效吸收表面积增加了20多倍;同时根据表面建模和几何光学的方法在200-2000 nm的光谱范围内进行了反射率仿真,仿真结果与实验测试数据较为接近,从而在理论上验证了该特殊结构的强吸收性是由飞秒激光加工的硅材料有效吸收表面积增加和"黑硅"结构的陷光效应而引起的。
In order to study the special optical absorption efficiency of "black silicon" materials,"black silicon" material with different heights of micro-cones is successfully fabricated,and the geometric parameters of the micro-cones are measured by scanning electron microscope(SEM).Then a model is built to calculate the surface effective absorption area of "black silicon" material based on the measured structure of "black silicon" material,and the surface area of "black silicon" is more than 20 times than that of normal silicon.Meantime,according to the geometrical optics method,the reflectivity is simulated during the wavelength from 200 nm to 2000 nm.The simulation results are relatively close to the experimental results.It is theoretically verified that the strong optical absorption ability of the silicon with micro-nano structure is due to special structure for light trapping effect and the increase of surface effective absorption area.