中文摘要：

选取无硼（NaCl-KCl-NaF—SiO2）和含硼（NaCl—KCl-NaF-SiO2-Na2B4O7）两种熔盐通过电沉积的方法在纯铁表面制备了渗硅层。利用辉光放电光谱仪、扫描电镜（SEM）和X射线衍射仪（XRD）对渗硅层渗入元素的含量与分布、表面形貌及物相组成进行了检测分析。结果表明，硼的加入起到了明显的催渗作用，含硼试样渗层较厚，硅分布均匀；表面平整、致密，晶粒细小；含硼试样由Fe2B及Fe3Si组成，无硼试样由Fe3Si及Si在α—Fe中的固溶体α—Fe（Si）组成，硼的加入降低了Fe3Si的有序度。

英文摘要：

The siliconized layers on pure iron were prepared by electrodeposition in molten salts with and without boron （NaC1-KC1-NaF-SiO2-Na2 B4 07 and NaCI-KC1-NaF-SiO2）. The compositional depth profiles, surface morphologies and structures of the layers were studied by glow discharge spectrometry, scanning electron microscopy （SEM） and X-ray diffraction （XRD）. The results showed that boron had an obvious effect of catalysis in B- Si co-diffusion. After adding boron, the depth of the siliconized layer increased obviously;the distribution of Si atom in the layer was homogeneous; the surface appeared smooth and dense, and the grains were fine. The phase structure of the siliconized layer with boron was chiefly composed of Fe2 B and Fe3Si and that of the siliconized layer without boron was composed of Fe3Si and α-Fe （Si） solid solution. Boron could decrease the degree of ordering of Fe3 Si.