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Pulsed high energy density plasma processing silicon surface
  • 期刊名称：Thin Solid Films
  • 时间：0
  • 作者或编辑：3448
  • 第一作者所属机构：中国科学院物理研究所
  • 页码：2001，390，149
  • 语言：英文
  • 相关项目：HEDP法材料表面金属化及界面研究
作者： B.Liu|C.Z.Liu|D.J.Cheng|R.He|S.Z.Yang|
同期刊论文项目
HEDP法材料表面金属化及界面研究
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