Work function enhancement of indium tin oxide via oxygen plasma immersion ion implantation
- ISSN号:1009-0630
- 期刊名称:Plasma Science and Technology
- 时间:2013
- 页码:791-793
- 分类:O511.9[理学—低温物理;理学—物理] TP212.14[自动化与计算机技术—控制科学与工程;自动化与计算机技术—检测技术与自动化装置]
- 作者机构:[1]School of Medical Imaging, Shanghai University of Medicine and Health Sciences,Shanghai 201318, China, [2]Department of Light Sources and Illuminating Engineering, Fudan University, Shanghai 200433, China, [3]Graduate School of Science and Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan, [4]School of Electronic and Electrical Engineering, Shanghai University of Engineering Science, Shanghai 201620, China
- 相关基金:supported in part by National Natural Science of Foundation of China (Nos. 11005021, 51177017 and 11175049), the Grants-in-Aid for Scientific Research of Japan Society for the Promotion of Science (No. 21110010) and the Fudan University Excellent Doctoral Research Program (985 project) and the Ph.D Programs Foundation of Ministry of Education of China (No. 20120071110031)
- 相关项目:有机电致发光器件有机界面的等离子体修饰技术和机理研究
关键词:
表面等离子体波, 圆柱形, 激发, 微波特性, 石英, GHZ, 聚四氟乙烯, 等离子体源, 2.45 GHz microwave, surface wave plasma, circular waveguide, plasmadiagnosis
中文摘要:
CHANG Xijiang: 091031001@fudan.edu.cn