化学气相淀积(CVD)是合成碳纳米管最有效的方法之一,通过采用计算流体动力学(CFD)模拟方法建立喷嘴式CVD反应器的模型来模拟合成碳纳米管碳源,该模型可考虑质量、动量、热和反应物的质量分数以及产品种类、化学反应守恒问题。基于该模型,模拟了喷嘴式CVD反应器与非喷嘴式CVD反应器在反应过程中反应生成物分布与碳沉积速率分布,分析了喷嘴式CVD反应器在不同温度下碳沉积速率的变化规律。数值模拟结果表明:喷嘴式CVD反应器在反应过程中生成C的效率要优于非喷嘴式CVD反应器,并且在一定温度范围内,喷嘴式CVD反应器内部的碳沉积速率随着温度的升高而逐渐升高。
Chemical vapor deposition ( CVD) is one of the most efficient methods to synthesize carbon nanotubes ( CNTs) . This paper presents a model to simulate synthesizing CNTs by using a nozzle-type CVD reactor model. The model comprises of the conservation equations of mass, momentum, heat, the mass fractions of the reactant, product species and chemical reaction. Based on the model, this paper simulated the product distribution and the rate of carbon deposition velocity distribution in the nozzle-type CVD reactor or the CVD reactor without a nozzle, and compared the variation of carbon deposition rate of nozzle-type CVD reaction at different temperatures. The simulation results show that the nozzle type CVD reactor is more efficient than the CVD reactor without a nozzle. Moreover, at a certain temperature range,the carbon deposition rate increases as the temperature rise.