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SiO2 passivation layer grown by liquid phase deposition for silicon solar cell application
  • 时间:0
  • 分类:TN304.12[电子电信—物理电子学] O484.1[理学—固体物理;理学—物理]
  • 作者机构:[1]Institute of Solar Energy, and Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China, [2]Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, China
  • 相关基金:Acknowledgements This work was supported by the National Natural Science Foundation of China (Grant Nos. 61234005 and 11474201), and Shanghai Municipal Project (No. 14DZ1201000).
中文摘要:

表面钝化是为高有效的硅太阳能电池的主要要求之一。尽管当前的存在钝化技术是有效的,昂贵的设备被要求。在这份报纸,液体阶段免职(LPD ) 种的 SiO 2 钝化层的全面理解被介绍,它划算、很简单。annealing 以后过程能显著地提高 LPD SiO 2 电影的钝化效果,这被发现。而且,化学钝化和地效果钝化机制通过分析少数搬运人一生和 n 类型和 p 类型硅晶片的表面再结合速度在 LPD SiO 2 电影的突出的钝化效果起了重要作用,这被揭示。尽管免职参数几乎没在钝化效果上有小影响,他们影响了免职率。因此,适当免职参数应该小心地基于免职率和制造费用的妥协被选择。由作为表面钝化层利用 LPD SiO 2 电影,大规模晶片上的一节 19.5%-efficient 硅太阳能电池(156 公里 ch 天窗。它能减少吗??

英文摘要:

Surface passivation is one of the primary requirements for high efficient silicon solar cells. Though the current existed passivation techniques are effective, expensive equipments are required. In this paper, a comprehensive understanding of the SiO2 passivation layer grown by liquid phase deposition (LPD) was presented, which was cost-effective and very simple. It was found that the post-annealing process could significantly enhance the passivation effect of the LPD SiO2 film. Besides, it was revealed that both chemical passivation and field-effect passivation mechanisms played important roles in outstanding passivation effect of the LPD SiO2 film through analyzing the minority carrier lifetime and the surface recombination velocity of n-type and p-type silicon wafers. Although the deposition parameters had little influence on the passivation effect, they affected the deposition rate. Therefore, appropriate deposition para- meters should be carefully chosen based on the compromise of the deposition rate and fabrication cost. By utilizing the LPD SiO2 film as surface passivation layer, a 19.5%-efficient silicon solar cell on a large-scale wafer (156 mm × 156 mm) was fabricated.

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