表面钝化是为高有效的硅太阳能电池的主要要求之一。尽管当前的存在钝化技术是有效的,昂贵的设备被要求。在这份报纸,液体阶段免职(LPD ) 种的 SiO 2 钝化层的全面理解被介绍,它划算、很简单。annealing 以后过程能显著地提高 LPD SiO 2 电影的钝化效果,这被发现。而且,化学钝化和地效果钝化机制通过分析少数搬运人一生和 n 类型和 p 类型硅晶片的表面再结合速度在 LPD SiO 2 电影的突出的钝化效果起了重要作用,这被揭示。尽管免职参数几乎没在钝化效果上有小影响,他们影响了免职率。因此,适当免职参数应该小心地基于免职率和制造费用的妥协被选择。由作为表面钝化层利用 LPD SiO 2 电影,大规模晶片上的一节 19.5%-efficient 硅太阳能电池(156 公里 ch 天窗。它能减少吗??
Surface passivation is one of the primary requirements for high efficient silicon solar cells. Though the current existed passivation techniques are effective, expensive equipments are required. In this paper, a comprehensive understanding of the SiO2 passivation layer grown by liquid phase deposition (LPD) was presented, which was cost-effective and very simple. It was found that the post-annealing process could significantly enhance the passivation effect of the LPD SiO2 film. Besides, it was revealed that both chemical passivation and field-effect passivation mechanisms played important roles in outstanding passivation effect of the LPD SiO2 film through analyzing the minority carrier lifetime and the surface recombination velocity of n-type and p-type silicon wafers. Although the deposition parameters had little influence on the passivation effect, they affected the deposition rate. Therefore, appropriate deposition para- meters should be carefully chosen based on the compromise of the deposition rate and fabrication cost. By utilizing the LPD SiO2 film as surface passivation layer, a 19.5%-efficient silicon solar cell on a large-scale wafer (156 mm × 156 mm) was fabricated.