中文摘要：

以氨水、醋酸为催化剂，用正硅酸已酯（TEOS）为Si源，甘油作为防裂剂，聚乙烯醇（PVA1750）作为致缓剂和发泡剂，制作多孔SiO2薄膜。碱催化使得硅-羟基化合物的溶解度增大，并抑制了SiO2的聚合，弱酸的二步催化使硅-羟基化舍物聚合成10—100nm的胶粒。丙三醇和TEOS水解的中间体Si（OC2H5）4-x（OH）x硅羟基形成氢键，抑制了硅．羟基化合物的聚沉，PVA的存在减缓了溶胶的聚合，在快速退火炉热处理时产生多孔结构。多孔SiO2的厚度在3um内可调。

英文摘要：

Taking ammonia, acetic acid as catalyzer, TEOS as Si sources, glycerin as anti-cracking agent, PVA1750 as ingredients and foaming agent, porous silica film was fabricated. Alkli catalyzer makes the silicon-hydroxyl compound solubility increase, and restrain silica agregation, acid catalyzer makes the silicon-hydroxyl agregate to grain of 10-100 nm. Gylcerol and TEOS intermediate Si （0C2H5）4-x （OH）x compose hydrogen bond, and restrain silicon-hydroxyl compound sedimentation. PVA decrease sol＇s agregation makes porous structure in the thermal process. The porous silica film thickness is about 3 um.