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Coupled surface plasmon interference lithography based on a metal-bounded dielectric structure
  • ISSN号：0021-8979
  • 期刊名称：Journal of Applied Physics
  • 时间：0
  • 页码：1101-1105
  • 相关项目：基于近场超级透镜的亚波长纳米光刻技术的研究
作者： Guo, Xiaowei|Dong, Qiming|
同期刊论文项目
基于近场超级透镜的亚波长纳米光刻技术的研究
期刊论文 9 会议论文 3
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Numerical analysis of SPP maskless interference lithography system