中文摘要：

采用磁过滤直流阴极真空弧源沉积技术在Si基体和GCr15基体表面制备了C／C多层DLC膜，通过X射线光电子能谱仪分析薄膜结构特征；用原子力显微镜观察C／C多层DLC膜的表面形貌；采用台阶仪测试薄膜厚度；利用纳米硬度仪测试薄膜纳米硬度；在销盘式摩擦磨损试验机上进行C／C多层DLC膜在大气下的摩擦性能评价，同时比较了单层DLC膜、TiN膜和C／C多层DLC膜的耐磨性能．结果表明：C／C多层DLC膜表面光滑、致密，厚度达0．7μm，硬度高达68GPa，与SiC球对摩时的摩擦系数为0．10左右，耐磨性明显优于单层DLC膜和TiN膜．

英文摘要：

Diamond-like carbon muhilayer films of 0.7μm thickness were prepared on silicon and GCr15 steel substrate by filtered cathodic vacuum arc （FCVA） technique. Structure features of C/C multilayer films were examined by X-ray photoelectron spectroscopy （XPS）. Morphology and hardness of muhilayer were observed and determined with an atomic force microscope （AFM） and an nano-indenter respectively. Tribological properties were investigated using pin-on-disk tribometer. Results showed that hardness and elastic modulus of muhilayer films are approximately 68 and 309 GPa respectively, which are guite high for thick DLC films. Compared with monolithic DLC film and TiN film, C/C multilayer films exhibied excellent wear resistance. Friction coefficient of C/C muhilayer films agai,st SiC counter-face was about 0.10.