中文摘要：

Ni-Cr系合金靶材在溅射镀膜工业中应用广泛，结合材料计算模拟和少量关键实验，定量化地研究了M-Cr系合金材料在热处理过程的相结构、相转变和显微组织特征，以及离子束溅射中入射离子与Ni-Cr系合金靶材固体之间的相互作用，考察了溅射镀膜工艺中的影响因素，确定了离子束溅射的最佳工艺条件。通过真空感应悬浮熔炼技术，获得纯净、均匀的合金锭，结合相图分析，确定了一系列合金的热处理工艺，采用金相显微镜、扫描电子显微镜、能谱分析仪和x射线衍射分析仪，分析了合金试样的显微组织和物相结构。结果表明：Ni-Cr系合金的微观组织和微区成分对热处理工艺较为敏感，在1000～1200℃的范围内，BCC相中Ni元素的原子含量从5％变为30％。提出了适宜的均匀化热处理工艺，以便获得组织和成分比较均匀的高品质Ni-Cr系合金靶材。当Ni元素的原子含量在20％70％时，均匀化热处理在1200-1300℃之间比较适宜，而均匀化退火时间随退火温度的选取高低而不同，在2～24h的范围内变动。基于随机级联碰撞理论和蒙特卡洛方法，对离子束溅射中入射离子与M-Cr系合金靶材固体之间的相互作用进行模拟的结果表明，由于Ni和Cr的原子表面能较为接近，M-Cr系合金靶材的溅射产物成分与靶材成分不发生明显偏差，有利于靶材成分的选择和薄膜成分的控制。

英文摘要：

Ni-Cr binary alloy targets were widely used in sputtering industry. The phase structure, phase transformation and micro- structure under different heat treatment process of the Ni-Cr binary alloy were studied quantificationally by combining computational simulation with key experiments. The interaction between incident ions and solid target material was also simulated. The effects of sput- tering factors were analyzed, thus a set of optimization process parameters were obtained in ion beam sputtering process. By using vacu- um induction levitation melting technology, some pure and homogenous ingots were obtained. According to the calculated phase dia- gram, a series of heat treatments were carried out. The metaUographic microscopy, scanning electron microscopy plus energy diffraction spectrum experiment, X-ray diffraction analysis, were employed to analyse the microstructure and phase structure. The results showed that the alloy microstructure and composition distribution in micro-zone of Ni-Cr were sensitive to heat treatment process, for example, the atomic content of Ni in BCC phase changed from 5% to 30% when the heat treatment temperature changed from 1000 to 1200℃. The reasonable heat treatment annealing temperature of the Ni-Cr alloy to obtain high quality target materials with homogeneous struc- ture and composition was proposed. When the content of Ni was at 20% -70% （ atom fraction）, homogenization heat treatment and quenching at a high temperature range of 1200 - 1300℃, and uniform annealing time depended on annealing temperature ranges from 2 to 24 h. After simulating the interaction between the incident ion and solid atoms of Ni-Cr system alloy target material in the process of ion beam sputtering based on the random cascade collision theory and Monte Carlo theory, the composition of sputtering product and target material are not considerable deviation, because the Ni and Cr atomic surface energy are closed to each other. This characteristic is very positive in selection of target composition