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射频对非平衡磁控溅射沉积Cu膜的影响
  • 期刊名称：《核聚变与等离子体物理》27卷3期264-267页
  • 时间：0
  • 相关项目：CVD中尘埃颗粒对薄膜生长影响的物理机理的研究
同期刊论文项目
CVD中尘埃颗粒对薄膜生长影响的物理机理的研究
期刊论文 13 会议论文 1
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Digital Multi-Signature Based on The Controlled Quantum Teleportation
Experimental study on dust plasma’s parameters in the SiH4/C2H4/Ar discharge
Optical emission spectroscopic studies of ICP Ar plasma
Cu films deposited by unbalanced magnetron sputtering enhanced by ICP and magnetic field confinement
Formation and diagnosis of Dust Particles in a Radio-Frequency(RF) SiH4/C2H4/Ar discharge
A nonlinear theory of dust voids in cylindrical geometry
尘埃颗粒与等离子体鞘层相互作用的数值模拟
Cu Films Deposited by Unbalanced Magnetron Sputtering Enhanced by ICP and External Magnetic Field Confinement
Optical Emission Spectroscopic Studies of ICP Ar Plasma
Experimental study on parameters of dust plasma in SiH4/C2H4/Ar discharges