中文摘要：

通过单掩模紫外（UV）光刻、感应耦合等离子体（ICP）刻蚀及KOH∶H2O化学腐蚀,在硅片上制作5×5元面阵硅折射微光学结构。通过电化学方法将制成的硅精细图形结构转换成镍版,进而通过压制法将精细的镍版图形进一步转印到有机玻璃材料上,从而制成面阵光学波前出射结构。光刻版由结构尺寸在微米量级的大量微孔组成,其特征尺度和排布方式由算法生成。微形貌测试显示了制作的折射微光学波前出射结构具有预期的表面形貌特征。通过常规光学测试,比较和分析了出射复杂波前的情况。

英文摘要：

Through a technique mainly consisting of single mask ultraviolet （UV） photolithography, inductively coupled plasma （ICP） etching and KOH∶H2O chemical etching, refractive microoptics structure array of 5×5 over silicon wafer is fabricated. The fine patterns fabricated over silicon substrate are transferred into nickel mask by electrochemical method. The fine pattern structures over nickel mask are further copied into plastic materials by embossing operation. Photomask is composed of a large number of microholes with typical structural size in micrometer order, which are distributed by the algorithm. The surface profile characteristics of the fabricated refractive micro-optics structures are obtained by surface measurements. Through common optical measurement, emitted complex wavefronts are discussed and analyzed.