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Study on mechanism of etching in low pressure radio-frequency plasmas
  • ISSN号：1567-1739
  • 期刊名称：Current Applied Physics
  • 时间：0
  • 页码：S121-S125
  • 相关项目：反应离子刻蚀微观不均匀性的跨尺度研究
作者： Dai, Zhong-Ling|Yue, Guang|Wang, You-Nian|
同期刊论文项目
反应离子刻蚀微观不均匀性的跨尺度研究
期刊论文 13 会议论文 5
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