Ni—Mn—Ga磁性形状记忆合金薄膜是非常有用的多功能材料,为考察其光学反射特性,采用磁控溅射技术在单晶硅衬底上沉积了Ni56Mn27Ga17合金薄膜,并对其表面形貌和光学反射特性进行研究。研究结果表明,薄膜的表面粗糙度随退火温度的升高而增大;在300~800nm波长范围内,薄膜反射率均随波长的减小而降低,且薄膜整体谱线范围内的反射率随退火温度的升高而降低。
Ni-Mn-Ga magnetic shape memory alloy thin films are promising candidate of multi-functional materials. In order to explore its optical reflective properties, Ni56Mn27Ga17 thin film was deposited onto single silicon substrate by using magnetron sputtering technique. The surface morphology and optical reflective properties of the thin film were investigated with atomic force microscopy and spectrophotometer. The results showed that the surface roughness of the thin film increased with increasing annealing temperature, and the optical reflectivity of thin film decreased with decreasing wavelength in the range of wavelength between 300 and 800 nm. And the reflectivity of the thin film in the whole spectra range decreased with annealing temperature increase.