中文摘要：

在不同的实验环境条件下，对电子束蒸发制备的ZrO2／SiO2多层膜进行了高低温交变实验。扫描电子显微镜（SEM）和x射线衍射（XRD）的测试结果显示高低温交变前后薄膜内部均无晶体形成，膜层结构也无变化。测试高低温交变前后样片的透射率光谱、面形、激光损伤阈值，并对其进行分析。结果表明，在经历高低温交变实验之后，薄膜元件中心波长处的透射率下降，损伤阈值降低，面形向凹陷方向发展。

英文摘要：

The ZrO2/SiO2 multilayer thin films deposited by electron beam are studied by high-low temperature alternating experiment under different environmental conditions. The results of scanning electron microscope （SEM） and X-ray diffraction （XRD） show that there is no crystal forming and no change in layer structure before and after temperature test. The transmission spectrum, surface morphology and laser induced damage threshold （LIDT） are acquired by measurement before and after the high-low temperature environmental test and then are analyzed. The results show that after high-low temperature experiment, the spectral transmissivity of thin film components at the center of wavelengths declines, as well as LIDT, and surface deformation develops sag direction.