采用真空电弧沉积技术在玻璃上制备了N掺杂TiO2复合薄膜。通过X射线电子能谱(XPS)、X射线衍射(XRD)、紫外可见光谱(UV-Vis)等测试技术研究了沉积过程中氧氮比对TiO2-xNx薄膜结构和性能的影响。实验结果表明,经500℃退火后的TiO2-xNx薄膜均为锐钛矿相,N原子在TiO2网络结构中以取代O原子的形式存在。TiO2-xNx复合薄膜在400~800 nm可见光区的透过率达60%,随着氮含量的增加,吸收边发生红移。在可见光下对酸性品红的降解表明TiO2-xNx薄膜具有可见光活性,随氧氮比的降低可见光催化活性逐渐增强。经自然光照射2 h,不同氧氮比制备的TiO2-xNx薄膜对大肠杆菌、金黄葡萄球菌的杀菌率均达99%以上。
TiO2-xNx thin films were deposited on glass substrate by vacuum arc deposition at different ratios of oxygen pressure and nitrogen pressure(PO2 /PN2 ratio).TiO2-xNx thin films were characterized with X-ray diffraction(XRD),X-ray photoelectron spectros-copy(XPS) and ultraviolet visible light spectroscopy(UV-Vis).Effects of PO2 /PN2 ratio on microstructure and performance of TiO2-x Nx thin films were studied.The results showed that TiO2-xNx thin films deposited at different PO2 /PN2 ratios were the anatase cr...