中文摘要：

选用高纯度ITO颗粒（w（In2O3）∶w（SnO2）=9∶1）作为蒸发膜料、CAB（钙铝钡）红外玻璃为基片,利用离子辅助电子束蒸发技术在不同的沉积速率下制备了光学性能优良的ITO薄膜,并详细讨论了沉积速率对ITO薄膜可见光透过率、禁带宽度、短波截止限、长波截止限及红外区透过率等性能的影响。结果表明：沉积速率对ITO薄膜的光学性能具有重要影响。薄膜的可见光透过率最高可达82.6%,并随沉积速率的升高而降低;禁带宽度随沉积速率的改变在3.75～3.98eV之间变化,短波截止限随着禁带的宽化,向短波方向移动;在红外区,ITO薄膜的平均透过率随沉积速率的上升而明显减小,薄膜等离子波长λp发生蓝移现象。

英文摘要：

ITO thin films with excellent optical properties were deposited at different deposition rate by ion-assistant electron beam evaporation on CAB IR-glass,with high purity ITO particles were used as source material.And the effect of deposition rate on transmittance in the visible range,optical band gap,cut-off at shortwave,cut-off at longwave and transmittance in IR range were discussed elaborately.The result indicated that the optical properties of ITO thin film were profoundly influenced by deposition rate.The Taverage in the visible region decreased by increasing of deposition rate,the optimized Taverage was as high as 82.6% in the visible region;The shortwave cut-off shifted to the shortwave direction as the broadening of optical band gap which transferred between 3.75~3.98 eV;Taverage in the IR region decreased conspicuous by increasing of deposition rate,and the plasma wavelength took a blue-shift meanwhile.