中文摘要：

利用磁控溅射法制备了具有Pt缓冲层的[FePt]50多层膜。通过X射线衍射（XRD）分析和磁性测量研究了不同缓冲层厚度对样品微结构演变和磁性能的影响。结果表明，随着Pt缓冲层厚度（t≤8．6nm）的增加，薄膜合金的有序化温度明显降低，晶粒尺寸逐渐减小：FePt薄膜样品点阵常数c/a的比值逐渐减小，有序度参数S逐渐增大：同时样品的矫顽力也随着缓冲层厚度的增加而增大，在425℃退火的样品，其矫顽力由缓冲层厚度t=0时的398kA／m增加到t=8．6nm时的523kA／＇Itl（接近无缓冲层样品在500℃退火的值），平均变化率为14．53kA·m^-1／nm，有效地降低了样品的退火温度；与此同时，剩磁比逐渐减小，从0．68减少到0．56。

英文摘要：

The [Fe/Pt]50 multilayer films with Pt bufferlayers were deposited by DC magnetron sputerring. The effects of different buffelayer thicknesses on the microstructure transformation and magnetic properties of the [Fe/Pt]50 multilayer films were studied, The results show that the ordering temperature of FePt alloy films reduces obviously, and the grains become smaller with increasing of thickness of Pt bufferlayer; the c/a ratio of the lattice parameter of the film samples decreases and the parameter of the degree of order S increases gradually with increasing of thickness of the Pt bufferlayer, and the increase of thickness effectively promots the transformation of the fcc phase to the fct ordering phase; while the coercivity of the samples increases also with the increase of thickness of the bufferlayer The coercivity increases from 398 kA/m while the bufferlayer thickness of the sample annealed at 425 ℃ t=0 nm to 523 kA/m while the buffcrlayer thickness of the sample annealed at 500 ℃ t=-8.6 nm （close to the value of 500℃ annealed sample）, average increase of 14.53 kA·m^-1/nm, so increasing of thickness of the buffcrlayer effectively lowers the annealing temperature of the samples. The in-plane remanent squareness of the samples decreases from 0.68 to 0.56 with increasing of Pt buffcrlayer thickness from 0 to 8.64 nm.