中文摘要：

镍铂合金靶材广泛应用于半导体工业。通过磁控溅射，镍铂合金靶材在硅器件表面沉积并反应生成镍铂硅化物薄膜，实现半导体接触及互连。对镍铂硅化物在肖特基二极管制造和半导体集成电路中的应用进行了分析，综述了镍铂合金结构与性质研究成果及制备方法，提出了镍铂合金靶材高纯化、提高磁透率和控制晶粒度的发展趋势。

英文摘要：

NiPt alloy sputtering targets have been extensively used in semiconductor manufacturing industry. NiPt alloy films were deposited in the given silicon device via magnetron sputtering of NiPt target. And then the films reacted with silicon at certain temperature to form NiPt silicide which undertook the contact and interconnection function in semiconductor manufacturing. The application and the research status of NiPt alloy sputtering target were analyzed in detail and the development trend was proposed based on the above analysis.