采用磁控直流溅射法制备出纳米WO3薄膜,在N2气中进行退火处理。采用分光光度计、XRD等对退火前后的WO3薄膜进行了光学特性的分析。研究表明:在623K进行退火处理的薄膜均匀、致密,呈现出较好的结晶态。采用光源激发对纯WO3薄膜在不同温度条件下的氢敏特性进行了研究,实验显示:WO3薄膜对H2的敏感性与温度有关,在348K温度条件下,WO3薄膜的氢敏效应最好。
Nanocrystalline WO3 films are prepared by DC magnetron sputtering technique, and then annealed in N2 at different temperature. The structure and optical properties of the WO3 films are studied by XRD and speetrophotometer. The experimental results show that the films exhibit better erystallinity with the annealing temperatures higher than 623 K, and crystalline WO3 films show better optical property. The sensing properties of the WO3 films to hydrogen gas are studied at different working temperatures. It is found that the sensitivity of pure WO3 sensors is dependent on working temperature and the films response gets the greatest at 348 K.