中文摘要：

电子束光刻是微电子技术领域重要的光刻技术之一,它可以制备特征尺寸10nm甚至更小的图形.随着电子束曝光机越来越多地进入科研领域,它在微纳加工、纳米结构的特性研究和纳米器件的制备等方面都呈现出重要的应用价值.本文以几种常见的电子束曝光机为例,说明电子束光刻的工作原理和关键技术,并给出一些它在纳米器件和微纳加工方面的应用实例.

英文摘要：

Electron beam lithography （EBL） is one of the most important techniques in the area of the mieroelectronies for its ability of creating various patterns with the feature size of less than 10nm. It also has a great application on the nanotechnology, such as the nanofabrication, the characterization of nanostructures, and the realization of nanodevice. In this paper., we briefly reviewed the principle of the EBL and some key issues of the EBL process. The capabilities of EBL on the nanofabrication and the nanodevice were also illustrated from some recently achievements from the published references.