中文摘要：

本文利用朗缪尔双探针对电弧离子镀等离子体进行了诊断。双探针具有收集电流小的优点（小于离子饱和电流），可以避免探针在高密度电弧离子镀等离子体中被烧坏。利用离散傅里叶变换（DFT）对测量曲线进行平滑，有效地克服了电弧离子镀等离子体放电所固有的强烈波动。探针端部设计能够避免由薄膜沉积造成的探针与支撑杆短路问题。实验结果表明，等离子体密度随着弧电流和气压的增加而增加，而电子温度随着弧电流和气压变化不明显。另外，使用双靶放电等离子体密度和电子温度高于单靶放电。这些结果提供了电弧离子镀等离子体的基本参数，对于材料涂层工艺研究具有积极意义。

英文摘要：

A novel technique was developed to diagnose arc ion plating plasma with a Langmuir double probes. One advantage of newly-developed technique over the conventional one is that the small ion current detected by the double probes, much below the ion saturation limit, secures it from high density arc ion plating plasma. Anothcr is that the strong inherent fluctuation of the arc ion plating plasma was smoothed out by means of Discrete Fourier Tmnsform（DFT） algorithm. In addition, the tip apex of the probe was designed in such a way that no deposition could result in short circuit between the tip and its support. The experimental results show that as the arc current and gas pressure increase,the plasma density increases, while its electron temperature changed little. Besides, the electron temperature and the plasma density, generated by the double-target, were found to be higher than those produced by the single-target.