通过常规的透射光谱测量,提供一种获取GaAs/AlGaAs多量子阱材料中上电极层、多量子阱区域实际生长厚度的简便、无损伤的方法,这两个厚度参数在器件制备工艺、材料生长参数修正中起关键作用.
A convenient and nondestructive method for determining the structural thickness of GaAs based multi- quantum well material with conventional transmission spectrum measurement is presented. The obtained parameters are very valuable for the device fabrication and the material growth.