中文摘要：

利用磁过滤阴极真空弧沉积系统在硅片及以硅片为基底的2种弹性体材料表面沉积厚度为2．7nm的DLC膜，采用原子力显微镜和拉曼光谱仪对薄膜的形貌及成分进行分析，用纳米力学测试系统测量薄膜的弹性模量和硬度，用UMT-2型多功能微摩擦磨损试验机考察其摩擦性能．结果表明，以γ-缩水甘油醚氧丙基三甲氧基硅烷（187）为偶联剂的薄膜试样表面比以γ-氨丙基三乙氧基硅烷（APS）为偶联剂的薄膜试样表面更致密且粗糙度更低，薄膜的最上层为DLC膜．在硅表面沉积DLC薄膜可以显著降低其表面的摩擦系数（0．117～0．137），在低载荷条件下，含偶联剂及弹性体的DLC薄膜的摩擦系数低于硅表面沉积DLC的薄膜，且以187为偶联剂的薄膜试样的摩擦性能更佳；在高载荷条件下，硅表面沉积DLC的薄膜具有更优异的摩擦性能．

英文摘要：

Diamond-like carbon （ DLC ） films with thickness of 2.7 nm were deposited on silicon wafer and two other elastic elastomers with different coupling agents by filtered cathodic vacuum arc （FCVA） technique. The structure and topography of prepared films were studied by Raman spectroscopy and atomic force microscopy respectively. The hardness and elastic modulus of the films were measured by nano-indentation. The tribological property was investigated by micro tribo-tester. The results indicate that roughness of the sample 1 with coupling agent of γ-- （2, 3-epoxypropoxy） propyltrimethoxysilane （ 187 ） was lower than sample 2 with coupling agent of γ-aminopropyltriethoxysilane （APS）, and the surface structure of sample 1 was compacter than the other two samples. The Raman spectra indicates that the film on the top of the sample is DLC. The DLC deposited on the silicon wafer presented a lower coefficient of friction ranging from 0. 117 to 0. 137. The tribological property of the DLC film on elastic com- posite multilayer was better than that on silicon wafer directly, and the elastic nanocomposite DLC multilayer with 187 manifested the best tribological property under low load, but under high load, the sample 3 showed the best.