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中文摘要：
采用恒电位电沉积方法，在未经修饰的ITO导电玻璃基底上通过控制实验条件制备出不同形貌的纳米ZnO结构，而在经过ZnO纳米粒子膜修饰后的ITO导电玻璃基底上，制备出透明、高取向、粒径小于30nm的ZnO纳米棒阵列．用扫描电子显微镜（SEM）、X射线衍射（xRD）以及透射光谱对制备出的ZnO纳米棒阵列的结构、形貌和透明性进行了表征．测试结果表明，ZnO纳米棒阵列的平均直径为21nm，粒径分布窄，约18-25nm，择优生长取向为[001]方向，垂直于基底生长．当入射光波长大于400nm时，ZnO纳米棒阵列的透光率大于95％．
英文摘要：
ZnO nanocrystallines with different morphologies have been prepared on unmodified ITO substrate by using a potentiostatic electrodeposition method. After the ITO substrate was pre-modified with ZnO nanoparticles, a transparent and highly oriented ZnO nanorod array with a diameter less than 30 nm has been successfully prepared by the electrochemical deposition. The obtained ZnO nanostructure was characterized by scanning electron microscopy （SEM）, X-ray diffraction （XRD） and transmission spectroscopy. The resuits indicate that the average diameter of ZnO nanorod is about 21 nm, and the size distribution is about 18-25 nm. The nanorods, growing along [001] direction, are perpendicularly oriented to the substrate. When the wavelength of incident light is over 400 nm, the ZnO nanorod array films show high optical transmission of above 95%.
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