中文摘要：

在羟基化Si（111）表面制备十八烷基三氯硅烷（OTS）自组装单分子膜，利用AFM机械刻蚀技术，通过自编程序设计针尖走向，以金刚石针尖作为加工工具，在OTS自组装单分子膜的Si（111）表面刻蚀不同结构的纳米图案，通过预设针尖移动距离和扫描头Z向位移等参数控制纳米结构的大小和深度．结果表明：利用原子力显微镜（AFM）机械刻蚀技术在OTS自组装单分子膜的Si（111）表面加工出大小、深度可控的纳米图案，其中载荷与加工深度基本呈线性关系；所获得的纳米图案结构清晰，刻蚀试验的重复性较好；经过刻蚀后的图案化区域为裸露的SiO2／Si表面，与OTS覆盖区域相比其摩擦力和粘附力较大，其表面性质具有明显的可分辨性．

英文摘要：

An AFM-based scratch method was employed to fabricate nanopatterns, different kinds of structures were created within octadecyltrichlorosilane （OTS） self-assembled monolayers on Si（ 111 ） surface by using a C^＊＊ computer program to control the motion of the diamond AFM tip. Various nanopatterns of different sizes and depths were created by changing the moving distance and applied load while scratching on these SAMs. It was found that the relationship between load and scratched depth was linear, and a clear patterned nanostructure was formed. The scratched area was bare SiO2/Si, friction and adhesion in these regions were larger than that of the raw OTS surface, and the properties of these different area were distinguishable.