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A Rational Design of Heterojunction Photocatalyst CdS Interfacing with One Cycle of ALD Oxide
  • ISSN号:1005-0302
  • 期刊名称:《材料科学技术学报:英文版》
  • 时间:0
  • 分类:O643.36[理学—物理化学;理学—化学] TN305[电子电信—物理电子学]
  • 作者机构:[1]Department of Electronics and Key Laboratory of Photo-Electronic Thin Film Devices and Technology of Tianjin, Nankai University, Tianjin 300071, China, [2]School of Material Science and Engineering, Hebei University of Technology, Tianjin 300130, China, [3]Institute of Material Physics, Key Laboratory of Display Materials and Photoelectric Devices, Tianjin University of Technology, Tianfin 300384, China, [4]Tianjin Key Laboratory of Composite and Functional Materials and School of Materials Science and Engineering, Tianjin University, Tianjin 300072, China, [5]Key Laboratory of Optical Information Science and Technology, Ministry of Education, Institute of Modern Optics, Nankai University, Tianjin 300071, China
  • 相关基金:This work is supported by the National Natural Science Founda- tion of China (Nos. 11304161, 11104148, 21573117, 51171082, 11404172 and 61322508), the 1000 Youth Talents Plan, the Tianjin Natural Science Foundation (Nos. 13JCYBJC41100 and 14JCZDJC_37700), the National Basic Research Program of China (973 Program, Nos. 2014CB931703 and 2013CB328701 ), and the Fundamental Research Funds for the Central Universities.
中文摘要:

相片腐蚀是为湿化学的地里的 CdS 申请的主要障碍之一,并且原子层免职(ALD ) 作为压制腐蚀的一个有效方法被建议了。这里在 ALD 涂层以前, CdS,一个轻易地腐蚀剂光催化剂,经由热水的合成被综合存取基本腐蚀机制并且腐蚀剂地点。X 光检查光电子光谱学(XPS ) 和 X 光检查衍射(XRD ) 证明甲又蓝色的催化分解的失败由氧化从可溶的 CdSO 4 的形成发源同样准备的 CdS 的 S 2 。高决定传播电子显微镜学(HRTEM ) 进一步在 CdS nanoparticles 的塑造 V 的区域识别了活跃地点,由模仿的电场分发证实了。为了讲道理地在 CdS ,正确候选人和他们的厚度上覆盖氧化物,被我们的通道模型基于量机制,保护的层的厚度应该在之上是不到 0.5nm 维持高通道可能性与转移矩阵方法考虑了,并且这样 ALD TiO 2或艾尔 2 O 3被建议使钝化平衡搬运人交通和腐蚀抑制的 CdS 粉末。把结果基于 HRTEM,我们发现活跃塑造 V 的区域被 ALD 氧化物盖住(TiO 2 或艾尔 2 O 3) 。为每个盒子,在 photocatalytic 反应基于 XPS 大小前后,没有可溶的 CdSO 4 被发现了。重要地,我们注意到与 ALD 的一个周期的钝化,催化剂一生被伸长直到 > 比同样准备的 CdS 的高 14 倍。

英文摘要:

Photo-corrosion is one of the major obstacles for CdS application in wet chemical fields, and atomic layer deposition (ALD) has been proposed as an effective way to suppress the corrosion. Here, prior to ALD coating, CdS, one facilely corrosive photocatalyst, was synthesized via hydrothermal synthesis to access the fundamental corrosion mechanism and the according corrosive sites. X-ray photoelectron spectros- copy (XPS) and X-ray diffraction (XRD) demonstrated that the failure of catalytic decomposition of methylene blue originated from the formation of soluble CdSO4 by oxidizing S2 of as-prepared CdS. High resolu- tion transmission electron microscopy (HRTEM) further identified the active sites in the V-shaped regions ofCdS nanoparticles, confirmed by the simulated electric field distribution. To rationally coat oxides on CdS, the right candidates and their thicknesses have been considered by our tunneling model with trans- fer matrix method based on quantum mechanism, upon which the thickness of protective layer should be less than 0.5 nm to maintain a high tunneling probability, and thus one cycle of ALD TiO2 or AbO3 was proposed to passivate the CdS powder to balance the carrier transportation and corrosion suppres- sion. Based on HRTEM results, we found that the active V-shaped region was covered by ALD oxides (TiO2 or AbO3). For each case, no soluble CdSO4 has been found before and after photocatalytic reactions based XPS measurements. Importantly, we noticed that with the passivation of one cycle of ALD, the catalyst's lifetime was elongated up to 〉14 times higher than that of the as-prepared CdS.

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期刊信息
  • 《材料科学技术学报:英文版》
  • 中国科技核心期刊
  • 主管单位:中国科协
  • 主办单位:中国金属学会
  • 主编:
  • 地址:中国沈阳文化路72号
  • 邮编:110016
  • 邮箱:
  • 电话:024-83978208
  • 国际标准刊号:ISSN:1005-0302
  • 国内统一刊号:ISSN:21-1315/TG
  • 邮发代号:
  • 获奖情况:
  • 国家“双百”期刊
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  • 被引量:474