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GaNas an Interfacial Passivation Layer: Tuning Band Offset and Removing FermiLevel Pinning for III–V
  • ISSN号：1944-8244
  • 期刊名称：ACS Applied Materials & Interfaces
  • 时间：2015.2.2
  • 页码：5141-5149
  • 相关项目：基于氧化物稀磁半导体的新型磁性金属颗粒薄膜的巨霍尔效应及应用
作者： H. Liu|K. Cho|R. Wallace|W. Wang|
同期刊论文项目
基于氧化物稀磁半导体的新型磁性金属颗粒薄膜的巨霍尔效应及应用
期刊论文 19 会议论文 2 专利 3
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