以飞高低于5nm的五体三层式皮米磁头为研究对象,采用有限控制体法和三阶Runge-Kutta方法,求解磁头的运动学方程和雷诺方程,得到皮米磁头在飞跃盘面凸起障碍过程中,其飞行姿态的变化规律。模拟结果表明盘面的微小凸起会引起磁头飞行姿态的波动,而且当凸起位于气膜正压区时,磁头飞行姿态波动幅度大于凸起位于气膜负压区时磁头飞行姿态的波动幅度;在磁头飞过盘面障碍后,原先的稳定飞行姿态被改变,而飞行姿态的改变会影响磁头的读写质量,通过设计合理的头/盘几何参数,可有效降低波动量,从而提高读写质量。
Using a pico slider with flying height below 5nm as a physical model, we analyzed its dynamic flying characteristics by means of coupling solution of the slider's motion equation and Reyn- olds lubrication equation when the slider flied over a rectangular step on the disk. A third order Runge --Kutta method was used to solve the slider's motion equation and control volume method was used to solve the Reynolds lubrication equation. The following conclusions can be drawn from the simulation results : ①the rectangular step on the disk will cause the fluctuation of the slider's flying height, when the rectangular step is under the positive air bearing pressure region, the height fluctuation of the slider is larger than that under the negative air bearing pressure region;②the slider flies in differ ent stable situations after the rectangular step on the disk exits it completely, the change of flying characteristics affects the quality of reading/writing data.