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Intrusion Simulation of a C60 Ball into Sliding Contact Space with Graphene Layered Surfaces
  • ISSN号:1002-185X
  • 期刊名称:Rare Metal Materials and Engineering
  • 时间:0
  • 页码:132-135
  • 分类:TG146.4[金属学及工艺—金属材料;一般工业技术—材料科学与工程;金属学及工艺—金属学]
  • 作者机构:Xi An Jiao Tong Univ, Sch Mech Engn, Key Lab Educ Minist Modern Design & Rotor Bearing, Xian 710049, Peoples R China
  • 相关基金:NSFC(90923027 and 51050110137);The Fundamental Research Funds for Central Universities
  • 相关项目:ECR纳米表面的极端制造原理与方法研究
中文摘要:

The intrusion process of a C60 molecular ball into a sliding contact space with garaphene layered surfaces was simulated using the Molecular Dynamic approach.The contact space was made up by two silicon substrates with graphene layered on the surface of the upper substrate forming an included angle which was defined as initial entry angle changing from 20°to 90°.Then a linear velocity of 30/ps was applied to the lower substrate along horizontal direction.The simulation was carried out using Tesoff potential of C and Si atoms at room temperature 300K.The simulation results showed that when the intrusion angle exceeded a critical angle of 80°,the C60 ball could not intrude the contact space,and the number of the sticking atoms sharply increased.Also,the dependence of maximum pull-off force acting on the upper substrate on the initial entry angle during the C60 intrusion process was calculated in which the critical force for C60 intrusion is found.All the results showed that the upper silicon substrate was well protected by the mono graphene layer.

英文摘要:

The intrusion process of a C60 molecular ball into a sliding contact space with garaphene layered surfaces was simulated using the Molecular Dynamic approach.The contact space was made up by two silicon substrates with graphene layered on the surface of the upper substrate forming an included angle which was defined as initial entry angle changing from 20°to 90°.Then a linear velocity of 30/ps was applied to the lower substrate along horizontal direction.The simulation was carried out using Tesoff potential of C and Si atoms at room temperature 300K.The simulation results showed that when the intrusion angle exceeded a critical angle of 80°,the C60 ball could not intrude the contact space,and the number of the sticking atoms sharply increased.Also,the dependence of maximum pull-off force acting on the upper substrate on the initial entry angle during the C60 intrusion process was calculated in which the critical force for C60 intrusion is found.All the results showed that the upper silicon substrate was well protected by the mono graphene layer.

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期刊信息
  • 《稀有金属材料与工程》
  • 中国科技核心期刊
  • 主管单位:中国科学技术协会
  • 主办单位:中国有色金属学会 中国材料研究学会 西北有色金属研究院
  • 主编:张平祥
  • 地址:西安市51号信箱
  • 邮编:710016
  • 邮箱:RMME@c-nin.com
  • 电话:029-86231117
  • 国际标准刊号:ISSN:1002-185X
  • 国内统一刊号:ISSN:61-1154/TG
  • 邮发代号:52-172
  • 获奖情况:
  • 首届国家期刊奖,中国优秀期刊一等奖,中国有色金属工业优秀期刊1等奖
  • 国内外数据库收录:
  • 俄罗斯文摘杂志,美国化学文摘(网络版),荷兰文摘与引文数据库,美国工程索引,美国科学引文索引(扩展库),英国科学文摘数据库,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),中国北大核心期刊(2011版),中国北大核心期刊(2014版),中国北大核心期刊(2000版)
  • 被引量:24715