位置：成果数据库 > 会议 > 会议详情页
Improved tangent space based distance metric for accurate lithographic hotspot classification
  • 所属机构名称：复旦大学
  • 会议名称：49th Annual Design Automation Conference, DAC
  • 时间：2012
  • 成果类型：会议
  • 相关项目：成品率驱动的纳米尺度集成电路设计方法学研究
作者： Yang, Fan|Sinha, Subarna|Chiang, Charles|Zeng, Xuan|
同会议论文项目
成品率驱动的纳米尺度集成电路设计方法学研究
期刊论文 30 会议论文 16 获奖 4
同项目会议论文
Machine Learning and Pattern Matching in Physical Design
Efficient Multivariate Moment Estimation Via Bayesian Model Fusion for Analog and Mixed-Signal Circu
Serpentine Poly-Si Nanowire Junction-less Bio-FETs Implemented by Industrial CMOS Process
Efficient Spatial Variation Modeling via Robust Dictionary Learning
Layout Decomposition Co-Optimization for Hybrid E-Beam and Multiple Patterning Lithography
BMF-BD: Bayesian model fusion on bernoulli distribution for efficient yield estimation of integrated
AMOR: An efficient aggregating based model order reduction method for many-terminal interconnect cir
Efficient Post-layout Waveform Prediction via System Identification
Efficient Multiple Starting Point Optimization for Automated Analog Circuit Optimization via Recycli
Efficient Memory Partitioning for Parallel Data Access via Data Reuse
An Efficient Trajectory-based Algorithm for Model Order Reduction of Nonlinear Systems via Localized
Algorithms in ParAFEMImp: A Parallel andWideband Impedance Extraction Program for Complicated 3-D Ge
SIPredict: Efficient Post-Layout Waveform Prediction Via System Identification
Efficient Bit Error Rate Estimation for High-Speed Link by Bayesian Model Fusion
Layout Decomposition with Pairwise Coloring for Multiple Patterning Lithography