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Simulation of Sub-wavelength 3D Photomask Induced Polarization Effect by RCWA
  • 所属机构名称：北京理工大学
  • 会议名称：6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) -
  • 时间：2012
  • 成果类型：会议
  • 相关项目：超大数值孔径光刻成像与图形保真技术研究
作者： Yang, Liang|Li, Yanqiu|Liu, Lihui|Wang, Jianfeng|
同会议论文项目
超大数值孔径光刻成像与图形保真技术研究
期刊论文 70 会议论文 20 专利 75
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