位置：成果数据库 > 会议 > 会议详情页
Impact of MSD and Mask Manufacture Errors on 45nm-node Lithography
  • 所属机构名称：北京理工大学
  • 会议名称：6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT) -
  • 时间：2012
  • 成果类型：会议
  • 相关项目：超大数值孔径光刻成像与图形保真技术研究
作者： Han, Chunying|Li, Yanqiu|Liu, Lihui|Guo, Xuejia|Wang, Xuxia|Yang, Jianhong|
同会议论文项目
超大数值孔径光刻成像与图形保真技术研究
期刊论文 70 会议论文 20 专利 75
同项目会议论文
Detailed illuminator design for full field ArF lithography system with a method based on the fly'
High numerical aperture Hartmann wavefront sensor with pinhole array extended source
Improved wavefront reconstruction using difference Zernike polynomials for two double-shearing wavef
Influence of Flare and NA Error on Lithography
Source mask optimization using real-coded genetic algorithms
Comparison of wavefront reconstruction with modal method and zonal method for the inspection of cata
Simulation of Sub-wavelength 3D Photomask Induced Polarization Effect by RCWA
A technique for extracting and analyzing the polarization aberration of hyper-numerical aperture ima
In-situ aberration measurement technique based on aerial image with optimized source
In situ aberration measurement technique based on quadratic Zernike model
Three-dimensional polarization aberration in hyper-numerical aperture lithography optics
The Cross Talk of Multi-errors Impact on Lithography Performance and the Method of Its Control
Illuminator design for small field ArF lithography system
Symmetric polarization aberration compensation method based on scalar aberration control for lithogr
Polarization aberration influence on image in lithography system at hyper NA
Two-dimensional Interferogram Extrapolation Method Using Linear Carrier-frequency
Gradient-based Resolution Enhancement Optimization Methods based on Vector Imaging Model
Robust Resolution Enhancement Optimization Methods to Process Variations based on Vector Imaging Mod
Impact of non-uniform polarized illumination on hyper-NA lithography