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Layout decomposition co-optimization for hybrid e-beam and multiple patterning lithography
  • 所属机构名称：复旦大学
  • 会议名称：ACM/IEEE ASP-DAC, 2015
  • 时间：2015.1.19
  • 成果类型：会议
  • 相关项目：纳米尺度超大规模集成电路分析和优化设计研究
作者： Y. F. Yang, W. S. Luk, H. Zhou, C. H. Yan,|X. Zeng|
同会议论文项目
纳米尺度超大规模集成电路分析和优化设计研究
期刊论文 10 会议论文 9
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