中文摘要：

有 Zr 夹层的瞬间底层，也就是合成的底层，被采用在直接当前的弧血浆喷气化学药品在合成底层上扔的独立钻石电影 deposition.Freestanding 钻石电影解决裂缝形成的问题蒸汽 depositionCVD 方法与扫描电子 microscopySEM 被调查，X光检查光电子光谱学 XPS ，X光检查 diffractionXRD ，和拉曼 spectroscopy.In 增加，压力分发在大区域期间独立 diamon

英文摘要：

The Mo substrate with Zr interlayer,namely composite substrate,was employed to solve the problem of crack formation in the freestanding diamond film deposition.Freestanding diamond films deposited on the composite substrates by the direct current arc plasma jet chemical vapor deposition（CVD） method were investigated with scanning electron microscopy（SEM）,X-ray photoelectron spectroscopy （XPS）,X-ray diffraction（XRD）,and Raman spectroscopy.In addition,the stress distribution during the large area freestanding diamond film deposition on the composite substrate was analyzed based on the finite element model ANSYS.The results reveal that Zr interlayer can be easily destroyed during the post-deposition cooling process,which is helpful for stress release and crack avoiding in diamond films.