中文摘要：

尝试了一种低成本的三维微电极阵列微加工的新方法。玻璃划片形成的柱状阵列,经掩膜腐蚀后形成阳模板,再利用PDMS的微复制技术形成阴模板。利用阴模板进行电镀,可以得到三维微电极阵列。制作的铜电极阵列高度约180μm,为制作更长的神经微电极阵列打下了基础。

英文摘要：

We proposed a novel technology for fabrication of 3D neuron microelectrode arrays at low cost. Diced glass column were masked and etched to be a male mould. Through micro-replication technique, a female mould of Polydimethylsiloxane （PDMS） was obtained. A 3D microelectrode array was fabricated by electroplating utilizing the PDMS mould. The height of the copper electrode array was about 180 jura. This technology provided the basis for fabrication of longer neuron electrode array in the furture.